机构：预计ASML High NA EUV光刻机功耗约1400千瓦

美港电讯11-04

【机构：预计ASML High NA EUV光刻机功耗约1400千瓦】金十数据11月4日讯，TechInsights表示，每台ASML0.33NAEUV光刻机的功耗就已经达到了1170kW，而0.55NA(HighNA)光刻机的功耗预计将进一步增长至1400kW。

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