设备成本渐成先进制程重要因素，Hyper NA EUV光刻机价格恐破万亿韩元大关

中关村在线07-02

近日，据媒体报道，荷兰光刻机制造公司ASML预计于2030年左右推出的下一代光刻设备Hyper (0.75) NA EUV光刻机价格可能会突破一万亿韩元（约合人民币52.67亿元）。目前，传统的Low (0.33) NA EUV光刻机单台约为2500亿韩元（约合人民币13.17亿元），已开始交付的High (0.55) NA EUV光刻机单价已升至4000~5000亿韩元（约合人民币21.07 ~...

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