阿斯麦和IMEC联合光刻实验室启用：最早2025年大量生产High NA EUV

快科技06-04

快科技6月4日消息，据媒体报道，比利时微电子研究中心（IMEC）与阿斯麦（ASML）宣布在荷兰费尔德霍芬（Veldhoven）开设联合High-NA EUV光刻实验室（High NA EUV Lithography Lab）。该实验室经过多年的精心构建与集成，现已全面准备就绪，将为全球领先的逻辑和存储芯片制造商以及先进材料和设备供应商提供尖端技术支持。实验室内的核心设备为一台原型高数值孔径EUV...

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