SK海力士计划在第6代（1c工艺约10nm）DRAM的生产中使用Inpria下一代金属氧化物光刻胶（MOR），这是MOR首次应用于DRAM量产工艺。

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SK海力士计划在第6代（1c工艺约10nm）DRAM的生产中使用Inpria下一代金属氧化物光刻胶（MOR），这是MOR首次应用于DRAM量产工艺。消息人士称，SK海力士量产的1c DRAM上有五个极紫外 (EUV) 层，其中一层将使用MOR绘制。他还补充说，不仅SK海力士，三星电子也将追求这类无机PR材料。 (TheElec)

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SK海力士计划在第6代（1c工艺 约10nm）DRAM的生产中使用Inpria下一代金属氧化物光刻胶（MOR），这是MOR首次应用于DRAM量产工艺。

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SK海力士计划在第6代（1c工艺约10nm）DRAM的生产中使用Inpria下一代金属氧化物光刻胶（MOR），这是MOR首次应用于DRAM量产工艺。