【消息称三星计划量产的1c DRAM使用MOR光刻胶】金十数据4月30日讯，三星正在考虑在其下一代DRAM极紫外（EUV）光刻工艺中应用金属氧化物抗蚀剂（MOR）。

美港电讯04-30

【消息称三星计划量产的1c DRAM使用MOR光刻胶】金十数据4月30日讯，三星正在考虑在其下一代DRAM极紫外（EUV）光刻工艺中应用金属氧化物抗蚀剂（MOR）。MOR被业内认为是下一代光刻胶（PR），会接棒目前先进芯片光刻中的化学放大胶（CAR）。三星正考虑在第6代10纳米DRAM（1cDRAM）中使用MOR，主要在六层或七层上使用EUVPR，相关产品将于今年下半年投入生产。

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