佳能推出晶圆测量机，可提升光刻效率

界面2023-03-07

3月7日，据日经中文网消息，佳能推出了提高半导体生产效率的晶圆测量机。该机型能在描绘电路图的曝光工艺之前，以高精度检出晶圆上产生的偏差和变形。这样可以缩短曝光工艺花费的时间，提高成品率。

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